1.

国際会議録
国際会議録
1. XYZ on a chip: nanoscale fabrication, fluidics and optics directed toward applications within biology and medicine
Tang, Z. ; Chao, G. ; Tucay, A. ; Takai, E. ; Djukic, D. ; Lind, M.L. ; Hung, C. ; Guo, E. ; West, A. ; Osgood, R. ; Yardley, J. T.
出版情報: Organic nanophotonics.  pp.127-138,  2003.  Dordrecht.  Kluwer Academic Publishers
シリーズ名: NATO science series. Series 2, Mathematics, physics and chemistry
シリーズ巻号: 100
2.

国際会議録
国際会議録
2. Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation [6154-58]
Hung, C. Y. ; Zhang, B. ; Guo, E. ; Pang, L. ; Liu Y ; Wang K ; Dai G
出版情報: Optical Microlithography XIX.  pp.61541M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6154
3.

国際会議録
国際会議録
3. First 65-nm tape-out using inverse lithography technology (ILT) [5992-67]
Hung, C. -Y. ; Zhang, B. ; Tang, D. ; Guo, E. ; Pang, L. ; Liu, Y. ; Moore, A. ; Wang, K.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921U-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992
4.

国際会議録
国際会議録
4. Enhanced dispositioning of reticle defects for advanced masks using virtual stepper with automated defect severity scoring
Pang, L. ; Lu, A. ; Chen, J. ; Guo, E. ; Cai, L. ; Chen, J.-H.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.461-473,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256