Investigation of systematical overlay errors limiting litho process performance of thick implant resists
- 著者名:
- Grandpierre, A.G. ( Infineon Technologies AG (Germany) )
- Schiwon, R. ( Infineon Technologies AG (Germany) )
- Bruch, J.-. ( Infineon Technologies AG (Germany) )
- Nacke, C. ( Infineon Technologies AG (Germany) )
- Schroeder, U.P. ( Infineon Technologies AG (Germany) )
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5375
- 発行年:
- 2004
- 開始ページ:
- 1118
- 終了ページ:
- 1124
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452887 [0819452882]
- 言語:
- 英語
- 請求記号:
- P63600/5375.2
- 資料種別:
- 国際会議録
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