1.

国際会議録
国際会議録
1. 51. Chargcs in HID2 ALD gate dielcetrics
Bersuker, U. ; Zeitzoff, P. ; Brown, G. ; Kim, Y. ; Hoe, A. ; Lin, C. ; Young, C. ; Lysoght, P. ; Gardner, M. ; Murto, R. W ; Huff, H. R.
出版情報: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.417-422,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-14
2.

国際会議録
国際会議録
2. SUB-NANOMETER HIGH -K GATE STACK SCALING USING THE HF-LAST/NH3 AKNEAL INTERFACE
Peterson, J. ; Barnett, J. ; Young, C. ; Hou, A. ; Gutt, J. ; Gopalan, S. ; Lee, C.H. ; Li, H.J. ; Moumen, N. ; Chaudhary, N. ; Lee, B.H. ; Bersuker, G. ; Zietzoff, P. ; Brown, G.A. ; Lysaght, P. ; Gardner, M. ; Murto, R.W. ; Huff, H.
出版情報: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.93-99,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-26
3.

国際会議録
国際会議録
3. RPT N20 Oxides For Non-Volatile Memory Applications
Gardner, M. ; Fulford, J. ; Bhat, M. ; Kwong, D.L.
出版情報: Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.357-362,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-16
4.

国際会議録
国際会議録
4. 33 ALD of Advanced High-k and Metal Gate Stacks for MOS Devices
Gutt, J. ; Gopalan, S. ; Brown, G. A. ; Kirsch, P. D. ; Peterson, J. J. ; Gardner, M. ; Li, H.-J. ; Lysaght, P. ; Alshareef, H. N. ; Choi, K. ; Huffman, C. ; Wen, H. C. ; Majhi, P. ; Lee, B. H. ; Chatham, H. ; Park, S. ; Lanee, S. ; Bartholomew, L. ; Senzaki, Y. (Invited Paper)
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.282-292,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05
5.

国際会議録
国際会議録
5. The Role Silicon Surface Roughness Has Upon Producing Highly Reliable Tunnel/Gate Dielectric's
Gardner, M. ; Seaton, J. ; Fulford, J.
出版情報: Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.180-184,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-16
6.

国際会議録
国際会議録
6. Recent Developments in Ultratlsin Nitride Gate Stack Prepared by In-Situ RTP Multiprocessing for CMOS ULSI
Song, S.C. ; Kini, B.Y. ; Loan, H.F. ; Kwong, D.-L. ; Gardner, M. ; Fulford, J. ; Wristers, D. ; Gelpey, J. ; Marcus, S.
出版情報: Advances in rapid thermal processing : proceedings of the symposium.  pp.45-56,  1999.  Pennington, N. J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-10
7.

国際会議録
国際会議録
7. Nitrogen (N2) Implantation to Suppress Growth of Interfacial Oxide in MOCVD BST and Sputtered BST Films
Nieh, R. ; Qi, W-J. ; Jeon, Y. ; Lee, B. H. ; Lucas, A. ; Kang, L. ; Lee, J. C. ; Gardner, M. ; Gilmer, M.
出版情報: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.521-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 567
8.

国際会議録
国際会議録
8. Enhanced Degradation in P+-Poly PMOSFETs With Oxynitride Gate Dielectrics Under Hot-Hole Injection
Chen, Y. Y. ; Gardner, M. ; Fulford, J. ; Wristers, D. ; Joshi, A. B. ; Kwong, D. L.
出版情報: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.283-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 567
9.

国際会議録
国際会議録
9. Formation of High-Quality Oxynitride Gate Dielectrics by High Pressure Thermal Oxidation of Si in NO
Song, S. C. ; Lee, C. H. ; Luan, H. F. ; Kwong, D. L. ; Gardner, M. ; Fulford, J. ; Allen, M. ; Bloom, J. ; Evans, R.
出版情報: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.65-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 567
10.

国際会議録
国際会議録
10. High-Quality Ultrathin CVD Si3N4 Gate Dielectrics Fabricated by Rapid Thermal Process
Song, S. C. ; Luan, H. F. ; Gardner, M. ; Fulford, J. ; Allen, M. ; Kwong, D. L.
出版情報: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.83-,  1999.  Warrendale, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 567