1.

国際会議録
国際会議録
1. Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20 [6349-36]
Huckabay, J. ; Staud, W. ; Naber, R. ; van Oosten, A. ; Nikolski, P. ; Hsu, S. ; Socha, R. J. ; Dusa, M. V. ; Flagello, D.
出版情報: Photomask Technology 2006.  pp.634910-634911,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6349
2.

国際会議録
国際会議録
2. Automatic pitch decomposition for improved process window when printing dense features at keff<0.20 [6283-102]
Huckabay, J. ; Staud, W. ; Naber, R. ; Dusa, M. ; Flagello, D. ; Socha, R.
出版情報: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830T-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6283