1.

国際会議録
国際会議録
1. New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices
Conley,W. ; Brunsvold,W.R. ; Buehrer,F. ; Dellaguardia,R. ; Dobuzinsky,D. ; Farrell,T.R. ; Ho,H. ; Katnani,A.D. ; Keller,R. ; Marsh,J. ; Muller,P. ; Nunes,R. ; Ng,H.Y. ; Oberschmidt,J.M. ; Ryan,D. ; Cotler-Wagner,T. ; Schulz,R. ; Ito,H. ; Hofer,D.C.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.282-299,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
2.

国際会議録
国際会議録
2. Viability of conventional high-NA KrF imaging for sub-0.25-ｦﾌm lithography
Farrell,T.R. ; Nunes,R. ; Campbell,R. ; Hoh,P. ; Samuels,D.J. ; Kirk,J.P. ; Conley,W.E. ; Iba,J. ; Shibata,T.
出版情報: Optical Microlithography IX.  Part1  pp.46-53,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2726
3.

国際会議録
国際会議録
3. Challenge of 1-Gb DRAM development when using optical lithography
Farrell,T.R. ; Nunes,R. ; Samuels,D.J. ; Thomas,A. ; Ferguson,R.A. ; Molless,A. ; Wong,A.K. ; Conley,W. ; Wheeler,D.C. ; Credendino,S. ; Naeem,M. ; Hoh,P. ; Lu,Z.
出版情報: Optical Microlithography X.  pp.333-341,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3051
4.

国際会議録
国際会議録
4. Good OPC:where will this drive mask CD tolerance and mask grid size
Samuels,D.J. ; Maurer,W. ; Farrell,T.R.
出版情報: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.588-596,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2621