1.

国際会議録
国際会議録
1. The Use of CMP in Making Computer Read/Write Heads
Phipps, P.B. ; Dill, F.H. ; Eschbach, F.O. ; Lee, E. ; Martin, F.
出版情報: Magnetic Materials, Processes, and Devices VI, Applications to Storage and Microelectromechanical Systems (MEMS) : proceedings of the International Symposium.  pp.381-388,  2000.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2000-29
2.

国際会議録
国際会議録
2. Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks
Cotte, E.P. ; Engelstad, R.L. ; Lovell, E.G. ; Tanzil, D. ; Eschbach, F.O. ; Korobko, Y.O. ; Fujita, M. ; Nakagawa, H.
出版情報: Optical Microlithography XVI.  Part Two  pp.1044-1054,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
3.

国際会議録
国際会議録
3. Hard pellicle study for 157-nm lithography
Shu, E.Y. ; Lo, F.-C. ; Eschbach, F.O. ; Cotte, E.P. ; Engelstand, R.L. ; Lovell, E.G. ; Okada, K. ; Kikugawa, S.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.558-569,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
4.

国際会議録
国際会議録
4. Pellicle-induced distortions in advance photomasks
Fujita, M. ; Akiyama, M. ; Kondo, M. ; Nakagawa, H. ; Tanzil, D. ; Eschbach, F.O. ; Cotte, E.P. ; Engelstad, R.L. ; Lovell, E.G.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.589-596,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
5.

国際会議録
国際会議録
5. Experimental and numerical studies of the effects of materials and attachment conditions on pellice-induced distortions in advanced photomasks
Cotte, E.P. ; Engelstad, R.L. ; Lovell, E.G. ; Tanzil, D. ; Eschbach, F.O. ; Shu, E.Y.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.579-588,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
6.

国際会議録
国際会議録
6. Improving photomask surface properties through a combination of dry and wet cleaning steps
Eschbach, F.O. ; Tanzil, D. ; Kovalchick, M. ; Dietze, U.U. ; Liu, M. ; Xu, F.
出版情報: Photomask and Next-Generation Lithography Mask Technology XI.  pp.209-217,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5446