Growth of Silicon Suboxide Layer Above An Atomically Abrupt SiO2/Si(100) Interface in Conventional Furnace Oxynitridation Using N2O Ambients
- 著者名:
Pennycook, Stephen J. ( Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN ) Browning, Nigel D. ( University of Illinois at Chicago, Chicago, IL ) Dang, SANJIT S. ( University of Illinois at Chicago, Chicago, IL ) Duscher, GERD ( University of Illinois at Chicago, Chicago, IL ) Rupangudi, Ramana V. ( University of Illinois at Chicago, Chicago, IL ) Takoudis, Christos G. ( University of Illinois at Chicago, Chicago, IL ) Trenary, Michael ( University of Illinois at Chicago, Chicago, IL ) - 掲載資料名:
- AIChE 1998 ANNUAL MEETING
- シリーズ名:
- AIChE meeting [papers]
- シリーズ巻号:
- 1998
- 発行年:
- 1998
- ペーパー番号:
- 103l
- 総ページ数:
- 2
- 出版情報:
- New York: American Institute of Chemical Engineers
- 言語:
- 英語
- 請求記号:
- A08000
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Materials Research Society |
American Institute of Chemical Engineers |
Electrochemical Society |
MRS-Materials Research Society |
Materials Research Society |
Materials Research Society |
Trans Tech Publications |
MRS-Materials Research Society |
MRS-Materials Research Society |
Electrochemical Society |
MRS-Materials Research Society |