1.

国際会議録
国際会議録
1. Experimental and numerical studies of the response of photomask hard pellicles to acoustic excitation
Cotte, E.P. ; Reu, P.L. ; Engeistad, R.L. ; Lovell, E.G. ; Grenville, A. ; Van Peski, C.K.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1121-1132,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
2.

国際会議録
国際会議録
2. Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks
Cotte, E.P. ; Engelstad, R.L. ; Lovell, E.G. ; Tanzil, D. ; Eschbach, F.O. ; Korobko, Y.O. ; Fujita, M. ; Nakagawa, H.
出版情報: Optical Microlithography XVI.  Part Two  pp.1044-1054,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5040
3.

国際会議録
国際会議録
3. Hard pellicle study for 157-nm lithography
Shu, E.Y. ; Lo, F.-C. ; Eschbach, F.O. ; Cotte, E.P. ; Engelstand, R.L. ; Lovell, E.G. ; Okada, K. ; Kikugawa, S.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.558-569,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
4.

国際会議録
国際会議録
4. Pellicle-induced distortions in advance photomasks
Fujita, M. ; Akiyama, M. ; Kondo, M. ; Nakagawa, H. ; Tanzil, D. ; Eschbach, F.O. ; Cotte, E.P. ; Engelstad, R.L. ; Lovell, E.G.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.589-596,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
5.

国際会議録
国際会議録
5. Experimental and numerical studies of the effects of materials and attachment conditions on pellice-induced distortions in advanced photomasks
Cotte, E.P. ; Engelstad, R.L. ; Lovell, E.G. ; Tanzil, D. ; Eschbach, F.O. ; Shu, E.Y.
出版情報: Photomask and Next-Generation Lithography Mask Technology IX.  pp.579-588,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4754
6.

国際会議録
国際会議録
6. Experimental investigation of hard pellicle purge processes
Abdo, A.Y. ; Nellis, G.F. ; Diab, A.K. ; Cotte, E.P. ; Chalekian, A.J. ; Engelstad, R.L. ; Lovell, E.G. ; Peski, C.V.
出版情報: 23rd Annual BACUS Symposium on Photomask Technology.  pp.897-904,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5256