A Novel Self-Aligned Field Induced Drain Polycrystalline Silicon Thin Film Transistor Fabricated by Using a Selective Side Etch Process
- 著者名:
Ta-Chuan Liao Chun-Yu Wu Feng-Tso Chien Chun-Chien Tsai Hsiu-Hsin Chen Chung-Yuan Kung Huang-Chung Cheng - 掲載資料名:
- Amorphous and polycrystalline thin-film silicon science and technology--2006 : symposium held April 18-21, 2006, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 910
- 発行年:
- 2007
- 開始ページ:
- 621
- 終了ページ:
- 626
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558998667 [1558998667]
- 言語:
- 英語
- 請求記号:
- M23500/910
- 資料種別:
- 国際会議録
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4
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