Heteroepitaxy on silicon : fundamentals, structure, and devices : symposium held April 5-8, 1988, Reno, Nevada, U.S.A.. pp.447-452, 1988. Pittsburgh, Pa.. Materials Research Society
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.325-330, 2003. Pennington, NJ. Electrochemical Society
Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. pp.216-223, 2003. Pennington, N.J.. Electrochemical Society
Beam-solid interactions and transient processes : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A.. pp.653-658, 1987. Pittsburgh, Pa.. Materials Research Society
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.569-574, 2005. Pennington, NJ. Electrochemical Society
Thin films : interfaces and phenomena : symposium held December 2-6, 1985, Boston, Massachusetts, USA. pp.57-62, 1985. Pittsburgh, Pa.. Materials Research Society
Lu, S. W. ; Nieh, C W. ; Chang, C. S. ; Chen, L.J.
出版情報:
Initial stages of epitaxial growth : symposium held April 22-24, 1987, Anaheim, California, U.S.A.. pp.293-298, 1987. Pittsburgh, Pa.. Materials Research Society
State-of-the-art program on compound semiconductors (SOTAPOCS XLII) and processes at the compound-semiconductor/solution interface : proceedings of the international symposia. pp.232-246, 2005. Pennington, N.J.. Electrochemical Society