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出版情報:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.282-292, 2005. Pennington, NJ. Electrochemical Society
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出版情報:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.264-270, 2004. Pennington, NJ. Electrochemical Society