1.

国際会議録
国際会議録
1. Applications of image diagnostics to metrology quality assurance and process control
Allgair, J.A. ; Boksha, V.V. ; Bunday, B.D. ; Diebold, A.C. ; Cole, D.C. ; Davidson, M.P. ; Hutcheson, J.D. ; Gurnell, A.W. ; Joy, D.C. ; McIntosh, J.M. ; Muckenhirn, S.G. ; Pellegrini, J.C. ; Larrabee, R.D. ; Potzick, J.E. ; Vlada, A.E. ; Smith, N.P. ; Starikov, A. ; Sulivan, N.T. ; Wells, O.C.
出版情報: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.251-277,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5042
2.

国際会議録
国際会議録
2. Implementation of Reference Measurement System using CD-AFM
Dixson, R.G. ; Guerry, A. ; Bennett, M.H. ; Vorburger, T.V. ; Bunday, B.D.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.150-165,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038
3.

国際会議録
国際会議録
3. CD-SEM measurement line-edge roughness test patterns for 193-nm lithography
Bunday, B.D. ; Bishop, M. ; Villarrubia, J.S. ; Vladar, A.E.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.674-688,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038
4.

国際会議録
国際会議録
4. Electron beam metrology of 193-nm resists at ultralow voltage
Sullivan, N.T. ; Dixson, R. ; Bunday, B.D. ; Mastovich, M.E. ; Knutrud, P.C. ; Fabre, P. ; Brandom, R.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.483-492,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038
5.

国際会議録
国際会議録
5. CD-SEM measurement line edge roughness test patterns for 193 nm lithography
Bunday, B.D. ; Bishop, M. ; Villarrubia, J.S. ; Vladar, A.E.
出版情報: Process and Materials Characterization and Diagnostics in IC Manufacturing.  pp.127-141,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5041
6.

国際会議録
国際会議録
6. Specifications and methodologies for benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node and beyond
Bunday, B.D. ; Bishop, M.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.1038-1052,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038
7.

国際会議録
国際会議録
7. Benchmarking of advanced CD-SEMs at the 130-nm CMOS technology node
Bunday, B.D. ; Bishop, M.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.102-115,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689
8.

国際会議録
国際会議録
8. Results of benchmarking of advanced CD-SEMs at the 90-nm CMOS technology node
Bunday, B.D. ; Bishop, M. ; Allgair, J.A.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.151-172,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5375
9.

国際会議録
国際会議録
9. Dimensional metrology of resist lines using a SEM model-based library approach
Villarrubia, J.S. ; Vladar, A.E. ; Bunday, B.D. ; Bishop, M.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.199-209,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5375
10.

国際会議録
国際会議録
10. Determination of optimal parameters for CD-SEM measurement of line-edge roughness
Bunday, B.D. ; Bishop, M. ; McCormack, D.W., Jr. ; Villarrubia, J.S. ; Vladar, A.E. ; Dixson, R. ; Vorburger, T.V. ; Orji, N.G. ; Allgair, J.A.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.515-533,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5375