1.

国際会議録
国際会議録
1. New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices
Conley,W. ; Brunsvold,W.R. ; Buehrer,F. ; Dellaguardia,R. ; Dobuzinsky,D. ; Farrell,T.R. ; Ho,H. ; Katnani,A.D. ; Keller,R. ; Marsh,J. ; Muller,P. ; Nunes,R. ; Ng,H.Y. ; Oberschmidt,J.M. ; Ryan,D. ; Cotler-Wagner,T. ; Schulz,R. ; Ito,H. ; Hofer,D.C.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.282-299,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
2.

国際会議録
国際会議録
2. PHS with inert blocking groups for DUV negative resist
Brunsvold,W.R. ; Conley,W. ; Varanasi,P.R. ; Khojasteh,M. ; Patel,N.M. ; Molless,A.F. ; Neisser,M.O. ; Breyta,G.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.372-384,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
3.

国際会議録
国際会議録
3. Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)
Varanasi,P.R. ; Jordhamo,G.M. ; Lawson,M.C. ; Chen,K.-J. ; Brunsvold,W.R. ; Hughes,T. ; Keller,R. ; Khojasteh,M. ; Li,W. ; Allen,R.D. ; Ito,H. ; Opitz,J. ; Truong,H.D. ; Wallow,T.I.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1157-1162,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
4.

国際会議録
国際会議録
4. Lithographic performance of an environmentally stable chemically amplified photoresist(ESCAP)
Conley,W.E. ; Breyta,G. ; Brunsvold,W.R. ; DiPietro,R.A. ; Hofer,D.C. ; Holmes,S.J. ; Ito,H. ; Nunes,R. ; Fichtl,G. ; Hagerty,P. ; Thackeray,J.W.
出版情報: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.34-60,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 2724
5.

国際会議録
国際会議録
5. "193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries"
Kajita,T. ; Nishimura,Y. ; Yamamoto,M. ; Ishii,H. ; Soyano,A. ; Kataoka,A. ; Slezak,M. ; Shimizu,M. ; Varanasi,P.R. ; Jordhamo,G. ; Lawson,M.C. ; Chen,R. ; Brunsvold,W.R. ; Li,W. ; Allen,R.D. ; Ito,H. ; Truong,H.D. ; Wallow,T.I.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.712-724,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345