1.

国際会議録
国際会議録
1. 23-P-14 - Synthesis of α-pinene derivatives using redox-mesoporous molecular sieves
Suh, Y.-W. ; Son, T.-M. ; Kim, N.-K. ; Ahn, W.-S. ; Rhee, H.-K.
出版情報: Zeolites and mesoporous materials at the dawn of the 21st century : proceedings of the 13th International Zeolite Conference, Montpellier, France, 8-13 July 2001.  pp.232-232,  2001.  Amsterdam.  Elsevier
シリーズ名: Studies in surface science and catalysis
シリーズ巻号: 135
2.

国際会議録
国際会議録
2. Evaluations of optical performance for micro-trench on quartz etch in ArF lithography [5853-67]
Ahn, W.-S. ; Kwon, H.-J. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
出版情報: Photomask and Next-Generation Lithography Mask Technology XII.  pp.818-826,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5853
3.

国際会議録
国際会議録
3. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
出版情報: Photomask and Next-Generation Lithography Mask Technology X.  pp.107-117,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5130
4.

国際会議録
国際会議録
4. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process
Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.
出版情報: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.964-971,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4889
5.

国際会議録
国際会議録
5. The study of optical performance for quartz dry etching quality in ArF lithography [6349-12]
Ahn, W.-S. ; Lee, H.-K. ; Park, Y.-J. ; Kwon, H.-J. ; Choi, S.-W. ; Han, W.-S.
出版情報: Photomask Technology 2006.  pp.63490C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6349