Quantitative Investigation of Near Interface Traps in 4H-SiC MOSFETs via Drain Current Deep Level Transient Spectroscopy
- 著者名:
M. Hauck J. Weisse J. Lehmeyer G. Pobegen H.B. Weber M. Krieger - 掲載資料名:
- Silicon Carbide and Related Materials 2016
- シリーズ名:
- Materials science forum
- シリーズ巻号:
- 897
- 発行年:
- 2017
- 開始ページ:
- 111
- 終了ページ:
- 114
- 総ページ数:
- 4
- 出版情報:
- Aedermannsdorf, Switzerland: Trans Tech Publications
- ISSN:
- 02555476
- ISBN:
- 9783035710434 [3035710430]
- 言語:
- 英語
- 請求記号:
- M23650
- 資料種別:
- 国際会議録
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4
国際会議録
Dependence of the Channel Mobility in 3C-SiC n-MOSFETs on the Crystal Orientation and Channel Length
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Reduction of Density of 4H-SiC / SiO2 Interface Traps by Pre-Oxidation Phosphorus Implantation
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