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OPC modeling by genetic algorithm

著者名:
W.C. Huang
C.M. Lai
B. Luo
C.K. Tsai
C.S. Tsay
C.W. Lai
C.C. Kuo
R.G. Liu
H.T. Lin
B.J. Lin
さらに 5 件
掲載資料名:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5754
発行年:
2005
パート:
2
開始ページ:
1229
終了ページ:
1240
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
言語:
英語
請求記号:
P63600/5754
資料種別:
国際会議録

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