Study of barrier coats for protection against airborne contamination in 157-nm lithography | 東京工業大学附属図書館文献データベース

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Study of barrier coats for protection against airborne contamination in 157-nm lithography

著者名:

Francis Houlihan

David Rentkiewicz

Ralph R. Dammel

Nickolay Stepanenko

Christoph Hohle

Masato Shigematsu

Etsuro Kawaguchi

さらに 11 件

掲載資料名:

Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5753(2)

発行年:

2005

パート:

2

開始ページ:

1136

終了ページ:

1149

総ページ数:

14

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457332 [0819457337]

言語:

英語

請求記号:

P63600/5753-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014978
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2005 : 22th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.02.28-2005.03.02
論文注記:	22th Symposium on Advances in resist technology and processing, 28 February-2 March, 2005, San Jose, California, USA

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