Diffusion contributions to line end shortening in 193-nm photolithography
- 著者名:
Eun-Kyung Son Jung-Woo Kim Sang-Hyang Lee Chan-Sik Park Jae-Woo Lee Jaehyun Kim Geun-Su Lee Sung-Koo Lee Keun-Do Ban Jae-Chang Jung Cheol Kyu Bok Seung-Chan Moon - 掲載資料名:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5753(2)
- 発行年:
- 2005
- パート:
- 2
- 開始ページ:
- 1040
- 終了ページ:
- 1048
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- 言語:
- 英語
- 請求記号:
- P63600/5753-2
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |
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MRS - Materials Research Society |
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5
国際会議録
High-Performance of Poly-Si TFTs With Multiple Selectively Doped Regions in the Active Layer
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