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Combined pattern collapse and LWR control at the 70 nm node through application of novel surface conditioner solutions

著者名:
Peng Zhang
Manuel Jaramillo
Madhukar B. Rao
Brenda Ross
Bridget Horvath
Patrick Wong
Wendy Gehoel
Stephan Sinkwitz
さらに 3 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(2)
発行年:
2005
パート:
2
開始ページ:
1018
終了ページ:
1023
総ページ数:
6
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-2
資料種別:
国際会議録

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