Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion | 東京工業大学附属図書館文献データベース

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Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion

著者名:

Shogo Matsumaru

Toshiyuki Ogata

Junichi Onodera

Toshio Sakamizu

Atsuko Yamaguchi

Hiroshi Shiraishi

さらに 7 件

掲載資料名:

Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5753(2)

発行年:

2005

パート:

2

開始ページ:

738

終了ページ:

745

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457332 [0819457337]

言語:

英語

請求記号:

P63600/5753-2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014978
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2005 : 22th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.02.28-2005.03.02
論文注記:	22th Symposium on Advances in resist technology and processing, 28 February-2 March, 2005, San Jose, California, USA

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1 国際会議録 A new 193nm resist Hirayama, T., Shiono, D., Matsumaru, S., Ogata, T., Hada, H., Onodera, J., Arai, T., Sakamizu, T., Yamaguchi, A., … SPIE - The International Society of Optical Engineering	7 国際会議録 Characteristics of low Eo 193-nm Chemical amplification resists [6153-82] Ogata, T, Kinoshita, Y, Furuya, S, Matsumaru, S, Takahashi, M, Shiono, D, Dazai, T, Hada, H, Shirai, M SPIE - The International Society of Optical Engineering
2 国際会議録 Molecular resists based on cholate derivatives for electron-beam lithography [6153-87] Shiono, D., Hirayama, T., Hada, H., Onodera, J., Arai, T., Yamaguchi, A., Kojima, K., Shiraishi, H., Fukuda, H. SPIE - The International Society of Optical Engineering	8 テクニカルペーパー Application of Tooth Flank Measurement and Numerical Machine Settings Kagimoto,Hiroshi, Akiho,Jun, Gosselin,Calude, Shiono,Toshio Society of Automotive Engineering, Inc.
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5 国際会議録 Material design of negative-tone polyphenol resist for EUV and EB lithography K. Kojima, S. Mori, D. Shiono, H. Hada, J. Onodera SPIE - The International Society of Optical Engineering	11 国際会議録 Surface and line-edge roughness in acid-breakable resin-based positive resist Sakamizu, T., Shiraishi, H. SPIE-The International Society for Optical Engineering
6 国際会議録 Acid diffusion control in chemical amplification positive resists by exchange reaction of conjugate bases Sakamizu,T., Arai,T., Yamaguchi,H., Shiraishi,H. SPIE-The International Society for Optical Engineering	12 国際会議録 Distribution control of protecting groups and its effect on LER for EUV molecular resist D. Shiono, H. Hada, H. Yukawa, H. Oizumi, I. Nishiyama, K. Kojima, H. Fukuda SPIE - The International Society of Optical Engineering

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