Bilayer resists based on polyhedral oligomeric silsesquioxane for 193-nm lithography
- 著者名:
Ramakrishnan Ganesan Jae-Hak Choi Hyo-Jin Yun Young-Gil Kwon Kyoung-Seon Kim Tae-Hwan Oh Jin-Baek Kim - 掲載資料名:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5753(2)
- 発行年:
- 2005
- パート:
- 2
- 開始ページ:
- 671
- 終了ページ:
- 678
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- 言語:
- 英語
- 請求記号:
- P63600/5753-2
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
Materials Research Society |
Materials Research Society |
American Society of Mechanical Engineers |
SPIE-The International Society for Optical Engineering |
American Institute of Chemical Engineers |
MRS - Materials Research Society |
11
国際会議録
Tailoring Conductivity of Carbon Nanotubes Network by Selective Oxidation with Halogen Oxoanions
Materials Research Society |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |