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UV pretreatments for improved etching of organic antireflective coating (ARC) layer

著者名:
掲載資料名:
Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2438
発行年:
1995
パート:
2
開始ページ:
540
終了ページ:
550
総ページ数:
11
出版情報:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417862 [0819417866]
言語:
英語
請求記号:
P63600/2438
資料種別:
国際会議録

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