Characterization and modeling of a chemically amplified resist for ArF lithography

Characterization and modeling of a chemically amplified resist for ArF lithography

著者名:

掲載資料名:

Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2438

発行年:

1995

パート:

1

開始ページ:

486

終了ページ:

495

総ページ数:

10

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417862 [0819417866]

言語:

英語

請求記号:

P63600/2438

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057641
シリーズID:	PA00000029
会議名:	Symposium on advances in resist technology and processing
回次:	12th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1995.02.20-1995.02.22
論文注記:	12th Symposium on advances in resist technology and processing, February 20-22, 1995, Santa Clara, CA, USA. 2438-68

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4 国際会議録 Effect of resist components on image spreading during postexposure bake of chemically amplified resists Hinsberg,W.D., Houle,F.A., Sanchez,M.I., Morrison,M.E., Wallraff,G.M., Larson,C.E., Hoffnagle,J.A., Brock,P.J., … SPIE - The International Society for Optical Engineering	10 国際会議録 Method of comparing chemical contrast with resist contrast Wallraff,G.M., Opitz,J., Breyta,G., Ito,H., Fuller,B.M. SPIE-The International Society for Optical Engineering
5 国際会議録 Effect of humidity on deprotection kinetics in chemically amplified resists Burns, S.D., Medeiros, D.R., Johnson, H.F., Wallraff, G.M., Hinsberg, W.D., Willson, C.G. SPIE-The International Society for Optical Engineering	11 国際会議録 Liquid immersion lithography: evaluation of resist issues Hinsberg, W., Wallraff, G.M., Larson, C.E., Davis, B.W., Deline, V., Raoux, S., Miller, D., Houle, F.A., Hoffnagle, J., … SPIE - The International Society of Optical Engineering
6 国際会議録 Real-time analysis of volatiles formed during processing of a chemically amplified resist Houle,F.A., Poliskie,G.M., Hinsberg,W.D., Pearson,D., Sanchez,M.I., Ito,H., Hoffnagle,J.A. SPIE - The International Society for Optical Engineering	12 国際会議録 Polymer design for 157-nm chemically amplified resists Ito,H., Wallraff,G.M., Brock,P.J., Fender,N., Truong,H.D., Breyta,G., Miller,D.C., Sherwood,M.H., Allen,R.D. SPIE-The International Society for Optical Engineering

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