193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system

193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system

著者名:

掲載資料名:

Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2438

発行年:

1995

パート:

1

開始ページ:

474

終了ページ:

485

総ページ数:

12

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417862 [0819417866]

言語:

英語

請求記号:

P63600/2438

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057641
シリーズID:	PA00000029
会議名:	Symposium on advances in resist technology and processing
回次:	12th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1995.02.20-1995.02.22
論文注記:	12th Symposium on advances in resist technology and processing, February 20-22, 1995, Santa Clara, CA, USA. 2438-67

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1 国際会議録 Limits to etch resistance for 193-nm single-layer resists Kunz,R.R., Palmateer,S.C., Forte,A.R., Allen,R.D., Wallraff,G.M., DiPietro,R.A., Hofer,D.C. SPIE-The International Society for Optical Engineering	7 国際会議録 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers Sooriyakumaran,R., Fenzel-Alexander,D., Brock,P.J., Larson,C.E., DiPietro,R.A., Wallraff,G.M., Hofer,D.C., Dawson,D.J., … SPIE - The International Society for Optical Engineering
2 国際会議録 Protecting groups for 193-nm photoresists Allen,R.D., Sooriyakumaran,R., Opitz,J., Wallraff,G.M., DiPietro,R.A., Breyta,G., Hofer,D.C., Kunz,R.R., Jayaraman,S., … SPIE-The International Society for Optical Engineering	8 国際会議録 Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists Allen, Robert D., Opitz, Juliann, Larson, Carl E., Wallow, Thomas I., DiPietro, Richard A., Breyta, Gregory, … American Chemical Society
3 国際会議録 Design Considerations for 193-nm Positive Resists Allen, Robert D., Wan, I- Y., Wallraff, Gregory M., DiPietro, Richard A., Hofer, Donald C., Kunz, Roderick R. American Chemical Society	9 国際会議録 Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes) Varanasi,P.R., Jordhamo,G.M., Lawson,M.C., Chen,K.-J., Brunsvold,W.R., Hughes,T., Keller,R., Khojasteh,M., Li,W., … SPIE - The International Society for Optical Engineering
4 国際会議録 Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm Opitz,J., Allen,R.D., Wallow,T.I., Wallraff,G.M., Hofer,D.C. SPIE-The International Society for Optical Engineering	10 国際会議録 New approaches to production-worthy 193-nm photoresists based on acrylic copolymers Wallow,T.I., Allen,R.D., Opitz,J., Dipietro,R.A., Brock,P.J., Sooriyakumaran,R., Hofer,D.C. SPIE-The International Society for Optical Engineering
5 国際会議録 Positive bilayer resists for 248-and 193-nm lithography Sooriyakumaran,R., Wallraff,G.M., Larson,C.E., Fenzel-Alexander,D., DiPietro,R.A., Opitz,J., Hofer,D.C., … SPIE-The International Society for Optical Engineering	11 国際会議録 Reactive ion etching of 193-nm resist candidates: current platforms and future requirements Wallow,T.I., Brock,P.J., DiPietro,R.A., Allen,R.D., Opitz,J., Sooriyakumaran,R., Hofer,D.C., Meute,J., Byers,J.D., … SPIE-The International Society for Optical Engineering
6 国際会議録 Role of photoacid structure on the performance of 193-nm resists Allen,R.D., Opitz,J., Larson,C.E., DiPietro,R.A., Breyta,G., Hofer,D.C. SPIE-The International Society for Optical Engineering	12 国際会議録 High-resolution 248-nm bilayer resist Lin, Q., Petrillo, K. E., Babich, K., Tulipe, D. C. La, Medeiros, D., Mahorowala, A., Simons, J. P., Angelopoulos, M., … SPIE - The International Society of Optical Engineering

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