New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group
- 著者名:
- 掲載資料名:
- Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2438
- 発行年:
- 1995
- パート:
- 1
- 開始ページ:
- 125
- 終了ページ:
- 142
- 総ページ数:
- 18
- 出版情報:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819417862 [0819417866]
- 言語:
- 英語
- 請求記号:
- P63600/2438
- 資料種別:
- 国際会議録
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