Process optimization of a positive-tone chemically amplified resist for 0.25-µm lithography using a vector scan e-beam tool

Process optimization of a positive-tone chemically amplified resist for 0.25-µm lithography using a vector scan e-beam tool

著者名:

掲載資料名:

Advances in resist technology and processing XII : 20-22 February 1995, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2438

発行年:

1995

パート:

1

開始ページ:

99

終了ページ:

112

総ページ数:

14

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417862 [0819417866]

言語:

英語

請求記号:

P63600/2438

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057641
シリーズID:	PA00000029
会議名:	Symposium on advances in resist technology and processing
回次:	12th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1995.02.20-1995.02.22
論文注記:	12th Symposium on advances in resist technology and processing, February 20-22, 1995, Santa Clara, CA, USA. 2438-40

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