Extreme ultraviolet scatter from particulate-contaminated mirrors

Extreme ultraviolet scatter from particulate-contaminated mirrors

著者名:

掲載資料名:

Optical scattering in the optics, semiconductor, and computer disk industries : 13-14 July 1995, San Diego, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2541

発行年:

1995

開始ページ:

174

終了ページ:

186

総ページ数:

13

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819419002 [0819419001]

言語:

英語

請求記号:

P63600/2541

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057742
シリーズID:	PA00000029
会議名:	Symposium on optical scattering in the optics, semiconductor, and computer disk industries
回次:	1995
会議開催地:	San Diego, CA, USA
会議開催年:	1995.07.13-1995.07.14
論文注記:	1995 Symposium on optical scattering in the optics, semiconductor, and computer disk industries, July 13-14, 1995, San Diego, CA, USA. 2541-22

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