Fabrication of multilayer optics by sputtering: application to EUV optics with greater than 30% normal reflectance

Fabrication of multilayer optics by sputtering: application to EUV optics with greater than 30% normal reflectance

著者名:

掲載資料名:

X-ray and extreme ultraviolet optics : 9-11 July 1995, San Diego, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2515

発行年:

1995

開始ページ:

576

終了ページ:

581

総ページ数:

6

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819418746 [0819418749]

言語:

英語

請求記号:

P63600/2515

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057717
シリーズID:	PA00000029
会議名:	Symposium on X-ray and extreme ultraviolet optics
回次:	1995
会議開催地:	San Diego, CA, USA
会議開催年:	1995.07.09-1995.07.11
論文注記:	1995 Symposium on X-ray and extreme ultraviolet optics, July 9-11, 1995, San Diego, CA, USA. 2515-67

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