Application of chemically amplified resists to photomask fabrication

Application of chemically amplified resists to photomask fabrication

著者名:

掲載資料名:

Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2512

発行年:

1995

開始ページ:

74

終了ページ:

87

総ページ数:

14

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819418708 [0819418706]

言語:

英語

請求記号:

P63600/2512

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057714
シリーズID:	PA00000029
会議名:	Symposium on photomask and X-ray mask technology
回次:	2nd
会議開催地:	Kawasaki, Japan
会議開催年:	1995.04.20-1995.04.21
論文注記:	2nd Symposium on photomask and X-ray mask technology, April 20-21, 1995, Kawasaki, Japan. 2512-17

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