Pattern-dependent correction of mask topography effects for alternating phase-shifting masks

Pattern-dependent correction of mask topography effects for alternating phase-shifting masks

著者名:

掲載資料名:

Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2440

発行年:

1995

開始ページ:

349

終了ページ:

360

総ページ数:

12

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417886 [0819417882]

言語:

英語

請求記号:

P63600/2440

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057643
シリーズID:	PA00000029
会議名:	Symposium on optical/laser microlithography
回次:	8th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1995.02.22-1995.02.24
論文注記:	8th Symposium on optical/laser microlithography, February 22-24, 1995, Santa Clara, CA, USA. 2440-30

類似資料:

1 国際会議録 Method to determine printability of photomask defects and its use in phase-shift mask evaluations Mansfield,S.M., Ferguson,R.A., Liebmann,L.W., Molless,A.F., Wong,A.K. SPIE - The International Society for Optical Engineering	7 国際会議録 Characterization of linewidth variation on 248- and 193-nm exposure tools Gabor,A.H., Brunner,T.A., Chen,J., Chen,N., Deshpande,S., Ferguson,R.A., Horak,D.V., Holmes,S.J., Liebmann,L.W., … SPIE-The International Society for Optical Engineering
2 国際会議録 Alternating phase-shifting mask with reduced aberration sensitivity: lithography considerations Wong,A.K., Liebmann,L.W., Molless,A.F. SPIE-The International Society for Optical Engineering	8 国際会議録 Focus shift and process latitude of contact holes on attenuated phase-shifting masks A.K. Wong, R.A. Ferguson, R.M. Martino, A.R. Neureuther Society of Photo-optical Instrumentation Engineers
3 国際会議録 Lithographic effects of mask critical dimension error Wong,A.K., Ferguson,R.A., Liebmann,L.W., Mansfield,S.M., Molless,A.F., Neisser,M.O. SPIE-The International Society for Optical Engineering	9 国際会議録 Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node Lai, K., Gallatin, G.M., Rosenbluth, A.E., Fonseca, C.A., Liebmann, L.W., Progler, C.J. SPIE-The International Society for Optical Engineering
4 国際会議録 Understanding across-chip line-width variation:the first step toward optical proximity correction Liebmann,L.W., Molless,A., Ferguson,R.A., Wong,A.K., Mansfield,S.M. SPIE-The International Society for Optical Engineering	10 国際会議録 High-resolution ultraviolet defect inspection of DAP(darkfield alternate phase)reticles Liebmann,L.W., Mansfield,S.M., Wong,A.K., Smolinski,J.G., Peng,S., Kimmel,K.R., Rudzinski,M.W., Wiley,J.N., … SPIE - The International Society for Optical Engineering
5 国際会議録 Through-pitch correction of scattering effects in 193-nm alternating phase-shift masks Burkhardt, M., Gordon, R.L., Hibbs, M.S., Brunner, T.A. SPIE-The International Society for Optical Engineering	11 国際会議録 Alternating phase-shifted mask for logic gate levels,design,and mask manufacturing Liebmann,L.W., Graur,I.C., Leipold,W.C., Oberschmidt,J.M., O'Grady,D.S., Regaill,D. SPIE - The International Society for Optical Engineering
6 国際会議録 Asymmetric biasing for subgrid pattern adjustment Wong,A.K., Liebmann,L.W. SPIE-The International Society for Optical Engineering	12 国際会議録 Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks Wong, A.K. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12