Automatic optical proximity correction with optimization of stepper condition

Automatic optical proximity correction with optimization of stepper condition

著者名:

掲載資料名:

Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2440

発行年:

1995

開始ページ:

240

終了ページ:

251

総ページ数:

12

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417886 [0819417882]

言語:

英語

請求記号:

P63600/2440

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057643
シリーズID:	PA00000029
会議名:	Symposium on optical/laser microlithography
回次:	8th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1995.02.22-1995.02.24
論文注記:	8th Symposium on optical/laser microlithography, February 22-24, 1995, Santa Clara, CA, USA. 2440-19

類似資料:

1 国際会議録 Novel methodology of employing scatterometry to assess optical proximity correction test pattern Asano, M., Koike, T., Mikami, T., Abe, H., Ikeda, T., Tanaka, S., Mimotogi, S. SPIE - The International Society of Optical Engineering	7 国際会議録 Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers Kobayashi,S., Uno,T., Yamamoto,K., Tanaka,S., Kotani,T., Inoue,S., Higurashi,H., Watanabe,S., Yano,M., Ohki,S., … SPIE - The International Society for Optical Engineering
2 国際会議録 Tandem process proximity correction method Hashimoto, K., Kuji, T., Tokutome, S., Kotani, T., Tanaka, S., Inoue, S. SPIE-The International Society for Optical Engineering	8 国際会議録 Proximity effect correction for reticle fabrication Sugiyama,M., Kubo,S., Hiruta,K., Iwamatsu,T., Fujisawa,T., Morimoto,H. SPIE - The International Society for Optical Engineering
3 国際会議録 Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module Kotani, T., Kobayashi, S., Ichikawa, H., Tanaka, S., Watanabe, S., Inoue, S. SPIE-The International Society for Optical Engineering	9 国際会議録 Automatic parallel optical proximity correction and verification system Watanabe,T., Tsujimoto,E., Nakajo,K., Maeda,K. SPIE - The International Society for Optical Engineering
4 国際会議録 Optical proximity correction for 0.15-ｦﾌm-rule memory devices Iwasaki,H., Tanabe,H., Inoue,T., Tanaka,Y. SPIE - The International Society for Optical Engineering	10 国際会議録 Effective exposure-dose measurement in optical microlithography Inoue,S., Fujisawa,T., Izuha,K. SPIE - The International Society for Optical Engineering
5 国際会議録 Efficient hybrid optical proximity correction method based on the flow of design for manufacturability (DfM) Kotani, T., Ichikawa, H., Urakami, T., Nojima, S., Kobayashi, S., Oikawa, Y., Tanaka, S., Ikeuchi, A., Suzuki, K., … SPIE-The International Society for Optical Engineering	11 国際会議録 Measurement of effective source shift using a grating-pinhole mask Sato,K., Tanaka,S., Fujisawa,T., Inoue,S. SPIE - The International Society for Optical Engineering
6 国際会議録 A 157-nm immersion microstepper Tanaka, S., Mimotogi, A., Inoue, S. SPIE - The International Society of Optical Engineering	12 国際会議録 Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition Izuha, K., Asano, M., Fujisawa, T., Inoue, S. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12