Development of an end-point detection procedure for the post-expose bake process

Development of an end-point detection procedure for the post-expose bake process

著者名:

掲載資料名:

Integrated circuit metrology, inspection, and process control IX : 20-22 February 1995, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2439

発行年:

1995

開始ページ:

78

終了ページ:

88

総ページ数:

11

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417879 [0819417874]

言語:

英語

請求記号:

P63600/2439

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057642
シリーズID:	PA00000029
会議名:	Symposium on integrated circuit metrology, inspection, and process control
回次:	9th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1995.02.20-1995.02.22
論文注記:	9th Symposium on integrated circuit metrology, inspection, and process control, February 20-22, 1995, Santa Clara, CA, USA. 2439-04

類似資料:

1 国際会議録 Analysis of in-situ vibration monitoring for end-point detection of CMP planarization processes Hetherington,D.L., Stein,D.J., Lauffer,J.P., Wyckoff,E.E., Shingledecker,D.M. SPIE - The International Society for Optical Engineering	7 国際会議録 Implementation of a new technology for point detection Petinarides, J., Griffin, M. T., Miller, R. A., Nazarov, E. G., Bashall, A. D. SPIE - The International Society of Optical Engineering
2 国際会議録 Impact of multi-product and -process manufacturing on run-to-run control (Invited Paper) Miller,M.L. SPIE-The International Society for Optical Engineering	8 国際会議録 Baking study of fluorinated 157-nm resist Houlihan, F.M., Sakamuri, R., Romano, A.R., Dammel, R.R., Conley, W., Rich, G.K., Miller, D., Rhodes, L.F., McDaniels, … SPIE-The International Society for Optical Engineering
3 国際会議録 Dynamic in-situ temperature profile monitoring of a deep-UV post-exposure bake process Cohen, B.M., Renken, W.G., Miller, P. SPIE-The International Society for Optical Engineering	9 国際会議録 New developments in two-dimensional fluorescence spectroscopy for rapid detection of organics in seawater Myrick,M.L., Yan,Y. SPIE - The International Society for Optical Engineering
4 国際会議録 A study of post-exposure baking effect for CAR process in photomask fabrication Park, D.-I., Seo, S.-K., Jeong, W.-G., Park, E.-S., Lee, J.-H., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S. SPIE-The International Society for Optical Engineering	10 国際会議録 Low-cost high-volume lens using diffractive technology Miller,M.L. SPIE-The International Society for Optical Engineering
5 国際会議録 Analysis of the Chandra x-ray observatory aspect camera PSF and its application to post-facto pointing aspect determination Morris,D.C., Aldcroft,T.L., Cameron,R.A., Cresitello-Dittmar,M.L., Karovska,M. SPIE-The International Society for Optical Engineering	11 国際会議録 486b. Enhancement of Lithography Processes Using Co₂: Co₂-Modified Development and Post Applied Bake Amy E. Zweber, Joseph M. DeSimone, Ruben G. Carbonell American Institute of Chemical Engineers
6 国際会議録 Real-time spectroscopic reflectometer for end-point detection on multichamber deposition processes Boher,P., Noygues,S., Stehle,J.L. SPIE-The International Society for Optical Engineering	12 国際会議録 SWIFT XRT point spread function measured at the Panter end-to-end tests Moretti, A., Campana, S., Tagliaferri, G., Abbey, A.F., Ambrosi, R.M., Angelini, L., Beardmore, A.P., Brauninger, H.W., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12