Focused ion beam deposition of new materials: dielectric films for device modification and mask repair, and tantalum films for x-ray mask repair
- 著者名:
- 掲載資料名:
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2437
- 発行年:
- 1995
- 開始ページ:
- 276
- 終了ページ:
- 283
- 総ページ数:
- 8
- 出版情報:
- Bellingham, WA: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819417855 [0819417858]
- 言語:
- 英語
- 請求記号:
- P63600/2437
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
MRS - Materials Research Society |
3
国際会議録
Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology
SPIE-The International Society for Optical Engineering |
9
国際会議録
Ion Beam Analysis and Applications in On-Line Monitoring of Ion Induced Modifications of Materials
Trans Tech Publications |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |