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Fabrication of 64-Mb DRAM using x-ray lithography

著者名:
掲載資料名:
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2437
発行年:
1995
開始ページ:
112
終了ページ:
125
総ページ数:
14
出版情報:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417855 [0819417858]
言語:
英語
請求記号:
P63600/2437
資料種別:
国際会議録

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