New excimer ultraviolet sources for photo-assisted deposition of thin films: an alternative to excimer-laser-induced deposition

New excimer ultraviolet sources for photo-assisted deposition of thin films: an alternative to excimer-laser-induced deposition

著者名:

掲載資料名:

Laser-induced thin film processing : 8-10 February 1995, San Jose, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2403

発行年:

1995

開始ページ:

290

終了ページ:

301

総ページ数:

12

出版情報:

Bellingham, WA: Society of Photo-optical Instrumentation Engineers

ISSN:

0277786X

ISBN:

9780819417503 [0819417505]

言語:

英語

請求記号:

P63600/2403

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00057606
シリーズID:	PA00000029
会議名:	Symposium on laser-induced thin film processing
回次:	1994
会議開催地:	San Jose, CA, USA
会議開催年:	1995.02.08-1995.02.10
論文注記:	1994 Symposium on laser-induced thin film processing, February 8-10, 1995, San Jose, CA, USA. 2403-23

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