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Microstress in high-pressure temperature-treated Czochralski-grown silicon with oxygen concentration up to 1.2 x 1018 cm-3

著者名:
A. Misiuk  
掲載資料名:
Solid state crystals, materials science and applications : 23-27 October 1994, Zakopane, Poland
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2373
発行年:
1995
開始ページ:
335
終了ページ:
340
総ページ数:
6
出版情報:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417206 [0819417203]
言語:
英語
請求記号:
P63600/2373
資料種別:
国際会議録

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