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Preparation of SiO2 film by direct photo-CVD on strained SiGe layer

著者名:
掲載資料名:
Second International Conference on Thin Film Physics and Applications : '94 TFPA : 15-17 April 1994, Shanghai, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2364
発行年:
1994
開始ページ:
131
終了ページ:
136
総ページ数:
6
出版情報:
Bellingham, WA: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819417084 [0819417084]
言語:
英語
請求記号:
P63600/2364
資料種別:
国際会議録

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