(533d) Low Pressure Metalorganic Chemical Vapor Deposition of Nickel Ferrite Thin Films On Ferroelectric Substrates

(533d) Low Pressure Metalorganic Chemical Vapor Deposition of Nickel Ferrite Thin Films On Ferroelectric Substrates

著者名:

掲載資料名:

Conference proceedings : 2009 AIChE annual meeting, Nashvikke, TN, November 8-13 : 09 AIChE annual meeting, Nashville, TN ; Non-topical conferences

シリーズ名:

AIChE Conference Proceedings

シリーズ巻号:

P-262

発行年:

2009

パート:

8

開始ページ:

166810

出版情報:

New York: American Institute of Chemical Engineers

ISBN:

9780816910586 [0816910588]

言語:

英語

請求記号:

A08000/2009 [CD-ROM]

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00061218
シリーズID:	PA00000008
会議名:	AICheE Annual Meeting ; Particle Technology Forum ; North American Mixing Forum ; Computational Molecular Science and Engineering Forum ; Nanoscale Science and Engineering Forum ; Sustainable Engineering Forum
回次:	2009
会議開催地:	Nashvikke, TN, USA
会議開催年:	2009.11.08-2009.11.13
論文注記:	[HTML document] 2009 AICheE Annual Meeting, Nashville, TN, November 8-13. Materials Engineering and Sciences Division

類似資料:

1 国際会議録 (213c) Chemical Vapor Deposition Route to Multifunctional Multiferroics Manish Singh, Yi Yang, Christos Takoudis American Institute of Chemical Engineers	7 国際会議録 Metalorganic Chemical Vapor Deposition of Magneto-Optical Ce: YIG Thin Films Li, Yi-Qun, Cherif, Mondher, Huang, Jankang, Liu, Wayne, Chen, Qiushui MRS - Materials Research Society
2 国際会議録 370f. Multiferroic BiFeO3 Thin Films Deposited by MOCVD Method Manish Singh, Yi Yang, Christos G. Takoudis American Institute of Chemical Engineers	8 国際会議録 Surface and Interface Properties of InSb Epitaxial Thin Films Grown on GaAs by Low-Pressure Metalorganic Chemical Vapor Deposition Li, K., Tan, K. L., Pelczynski, M., Feng, Z. C., Wee, A. T. S., Lin, J. Y., Ferguson, I., Stall, R. A. MRS - Materials Research Society
3 国際会議録 380h. Investigation of Local Coordination and Electronic Structure of Dielectric Thin Films from Theoretical Energy-Loss Spectra Javier Rosado, Manish Singh, Christos G. Takoudis American Institute of Chemical Engineers	9 国際会議録 Si Delta Doped GaN Grown by Low-Pressure Metalorganic Chemical Vapor Deposition Kim, J-H., Yang, G. M., Choi, S. C., Choi, J. Y., Cho, H. K., Lim, K. Y., Lee, H. J. MRS - Materials Research Society
4 国際会議録 Low-pressure metalorganic chemical vapor deposition of high-quality AlN and GaN thin films on sapphire and silicon substrates P. Kung, X. Zhang, E. Bigan, M. Razeghi, A. Saxler Society of Photo-optical Instrumentation Engineers	10 国際会議録 DEPOSITION OF DIAMOND FILMS ON NICKEL SUBSTRATES BY HOT FILAMENT CHEMICAL VAPOR DEPOSITION Yang, P.C., Zhu, W., Glass, J.T. Electrochemical Society
5 国際会議録 Metalorganic Chemical Vapor Deposition of Aluminum Oxide on Silicon Nitride Dasgupta, Anindya, Chowdhuri, Abhijit Roy, Takoudis, Christos G. Materials Research Society	11 国際会議録 (213e) Structural-Dielectric Property Relation From Compositional Tuning of ALD Deposited Yttrium-Stabilized Hafnium Oxide Films Qian Tao Sr., Gregory Jursich, Manish Singh, Christos G. Takoudis American Institute of Chemical Engineers
6 国際会議録 206e. Metal Organic Chemical Vapor Deposition of Titanium Oxynitride Films Using Tetrakis(Diethylamino)Titanium Xuemei Song, Christos G. Takoudis American Institute of Chemical Engineers	12 国際会議録 Growth And Characterization of GaN/InGaN by Low Pressure Metalorganic Chemical Vapor Deposition Feng, M.S., Guo, J.D., Chi, G.C. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12