(378e) First-Principles-Based Kinetic Modeling of Surface Growth During Plasma Deposition of Silicon Thin Films
- 著者名:
- 掲載資料名:
- Conference proceedings : 2009 AIChE annual meeting, Nashvikke, TN, November 8-13 : 09 AIChE annual meeting, Nashville, TN ; Non-topical conferences
- シリーズ名:
- AIChE Conference Proceedings
- シリーズ巻号:
- P-262
- 発行年:
- 2009
- パート:
- 8
- 開始ページ:
- 160744
- 出版情報:
- New York: American Institute of Chemical Engineers
- ISBN:
- 9780816910586 [0816910588]
- 言語:
- 英語
- 請求記号:
- A08000/2009 [CD-ROM]
- 資料種別:
- 国際会議録
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