Atomic-Scale Analysis of Silicon Hydride Dissociation on Surfaces of Plasma-Deposited Amorphous Silicon Thin Films

Atomic-Scale Analysis of Silicon Hydride Dissociation on Surfaces of Plasma-Deposited Amorphous Silicon Thin Films

著者名:

掲載資料名:

2006 AIChE annual meeting, November 12-17, 2006, San Francisco, California, San Francisco Hilton : conference proceedings. Non-topical conferences

シリーズ名:

AIChE Conference Proceedings

シリーズ巻号:

P-235

発行年:

2006

パート:

1

出版情報:

New York: American Institute of Chemical Engineers

ISBN:

9780816910120 [081691012X]

言語:

英語

請求記号:

A08000/2006 [CD-ROM]

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00061211
シリーズID:	PA00000008
会議名:	AIChE Annual Meeting ; Particle Technology Forum ; North American Mixing Forum ; Computational Molecular Science and Engineering Forum ; Nanoscale Science and Engineering Forum ; Sustainable Engineering Forum
回次:	2006
会議開催地:	San Francisco, CA, USA
会議開催年:	2006.11.12-2006.11.17
論文注記:	AIChE annual meeting conference, November 12-17, 2006, San Francisco, CA. Engineering Sciences and Fundamentals

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