Influence of Substrate Temperature and Post-Annealing Treatment on the Microstructure and Electric Properties of ZnO:Al Thin Films Deposited by Sputtering

Influence of Substrate Temperature and Post-Annealing Treatment on the Microstructure and Electric Properties of ZnO:Al Thin Films Deposited by Sputtering

著者名:

掲載資料名:

Advanced Materials Forum VI : Selected, peer reviewed papers from the Proceedings of the VI International Materials Symposium Materiais 2011 - XV Encontro da Sociedade Portuguesa de Materiais (SPM) Universidade do Minho, April 18-20, 2011, Guimaraes, Portugal

シリーズ名:

Materials science forum

シリーズ巻号:

730-732

発行年:

2013

パート:

1

開始ページ:

215

終了ページ:

220

総ページ数:

6

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00054216
シリーズID:	PA00000012
会議名:	International Materials Symposium Materiais
回次:	6th
会議開催地:	Guimaraes, Portugal
会議開催年:	2011.04.18-2011.04.20
論文注記:	6th International Materials Symposium Materiais 2011 - XV Encontro da Sociedade Portuguesa de Materiais (SPM) Universidade do Minho, April 18-20, 2011, Guimaraes, Portugal

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