Simulation of Substrate Temperature Distribution in Diamond Films Growth on Silicon Wafer by Hot Filament CVD

Simulation of Substrate Temperature Distribution in Diamond Films Growth on Silicon Wafer by Hot Filament CVD

著者名:

掲載資料名:

Advances in materials manufacturing science and technology XIV : selected, peer reviewed papers from the 14th International Manufacturing Conference in China (IMCC2011), October 13-15, 2011, Tianjin, China

シリーズ名:

Materials science forum

シリーズ巻号:

697-698

発行年:

2011

開始ページ:

454

終了ページ:

457

総ページ数:

4

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00054194
シリーズID:	PA00000012
会議名:	International Manufacturing Conference in China (IMCC2011)
回次:	14th
会議開催地:	Tianjin, China
会議開催年:	2011.10.13-2011.10.15
論文注記:	14th International Manufacturing Conference in China (IMCC2011), October 13-15, 2011, Tianjin, China

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6 国際会議録 Effect of Grain Size of CVD Diamond Film on Cutting Performance of Diamond Coated Micro Drills X.L. Lei, L. Wang, B. Shen, F.H. Sun, M. Chen Trans Tech Publications	12 国際会議録 Investigations of Growth Mechanisms of Diamond Thin Films by Hot Filament Assisted CVD Mercier J., Bonnot M. A., Caignol E., Cheeraert E. Plenum Press

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