Thin Film Stress and Texture Analysis at the MCX Synchrotron Radiation Beamline at ELETTRA

Thin Film Stress and Texture Analysis at the MCX Synchrotron Radiation Beamline at ELETTRA

著者名:

掲載資料名:

Residual stresses VIII : selected, peer reviewed papers from the 8th European Conference on Residual Stresses, ECRS8, 2010, June 26-28, 2010, Riva del Garda, Italy

シリーズ名:

Materials science forum

シリーズ巻号:

681

発行年:

2011

開始ページ:

115

終了ページ:

120

総ページ数:

6

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00054178
シリーズID:	PA00000012
会議名:	European Conference on Residual Stresses, ECRS8
回次:	8th
会議開催地:	Riva del Garda, Italy
会議開催年:	2010.06.26-2010.06.28
論文注記:	8th European Conference on Residual Stresses, ECRS8, 2010, June 26-28, 2010, Riva del Garda, Italy

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