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Formation of High Density Metal Silicide Nanodots on Ultrathin SiO2 for Floating Gate Memory Application

著者名:
掲載資料名:
THERMEC 2009, 6th International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS, Berlin, Germany, August 25-29, 2009
シリーズ名:
Materials science forum
シリーズ巻号:
638-642
発行年:
2010
パート:
2
開始ページ:
1725
終了ページ:
1730
総ページ数:
6
出版情報:
Aedermannsdorf, Switzerland: Trans Tech Publications
ISSN:
02555476
言語:
英語
請求記号:
M23650
資料種別:
国際会議録

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