Blank Cover Image

Photoelectron Spectroscopy Characterization and Computational Modeling of Gadolinium Nitride Thin Films Synthesized by Chemical Vapor Deposition

著者名:
掲載資料名:
Materials and technology for nonvolatile memories : symposium held November 30-December 5, 2014, Boston, Massachusetts. U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
1729
発行年:
2015
開始ページ:
131
終了ページ:
136
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781605117065 [1605117064]
言語:
英語
請求記号:
M23500/1729
資料種別:
国際会議録

類似資料:

1 国際会議録 CHARACTERIZATION OF SILICON-NITRIDE FILM GROWTH BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION (PRECVD)

Lu, Zhong, Ma, Yi, Habermehl, Scott, Lucovsky, Gerry

MRS - Materials Research Society
7 国際会議録 Plasma Enhanced Chemical Vapor Deposition of Zirconium Nitride Thin Films

Atagi, Lauren M., Samuels, John A., Smith, David C., Hoffman, David M.

MRS - Materials Research Society
2 国際会議録 Electrical Characterization of Gallium Nitride MIS Capacitors with An Oxide/Nitride/Oxide Gate Dielectric Synthesized by the Jet Vapor Deposition Technique

Gaffey, B., Chong, G., Guido, U., Wang, X.W., Ma, T.P.

Electrochemical Society
8 国際会議録 Plasma-enhanced chemical vapor deposition of nitrogen-rich silicon oxynitride thin film for gate insulator application

W.-J. Qi, W.-F. Yu, B.-Z. Li, J. Liu, F. Lu

Society of Photo-optical Instrumentation Engineers
3 国際会議録 Modeling of Laser Chemical Vapor Deposition of Thin Films

Kar A., Mazumder J.

Kluwer Academic Publishers
9 国際会議録 Photoluminescene properties of hydrogenated amorphous silicon nitride thin films deposited by helicon wave plasma chemical vapor deposition [6020-123]

Fu G., Yu W., Lu W., Zhu H., Zhang L., Ding W.

SPIE - The International Society of Optical Engineering
4 国際会議録 ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION OF GALLIUM NITRIDE THIN FILMS

Gordon, Roy G., Hoffman, David M., Riaz, Umar

Materials Research Society
10 国際会議録 Homoepitaxial Growth and Characterization of 4H-SiC Epilayers by Low-Pressure Hot-Wall Chemical Vapor Deposition

Sun, G.S., Ning, J., Gong, Q.C., Gao, X., Wang, L., Liu, X.F., Zeng, Y.P., Li, J.M.

Trans Tech Publications
5 国際会議録 Chemical Vapor Deposition of Boron Nitride Thin Films on SiC

M. Chubarov, H. Pedersen, H. Högberg, M. Garbrecht, Z. Czigány

Trans Tech Publications
11 国際会議録 Characterization of GaP Nanowires Synthesized by Chemical Vapor Deposition

K.K. Cho, K.H. Choi, K.W. Kim, G.B. Cho, Y.Y. Kim

Trans Tech Publications
6 国際会議録 Preparation of Boron Nitride Thin Films by Chemical Vapor Deposition

Nakamura,K.

Trans Tech Publications
12 国際会議録 Processing of PbTiO3 and Pb(ZrxTi1-x)O3 Thin Films by Novel Single-Solid-Source Metalorganic Chemical Vapor Deposition

Lu, Ping, Li, Hang, Sun, Shan, Tuttle, Bruce

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12