Electrochemical Behavior of Copper in Post-Via-Etch Cleaning Solutions
- 著者名:
- 掲載資料名:
- Cleaning and surface conditioning technology in semiconductor device manufacturing 10
- シリーズ名:
- ECS transactions
- シリーズ巻号:
- 11(2)
- 発行年:
- 2007
- 開始ページ:
- 395
- 終了ページ:
- 402
- 総ページ数:
- 8
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 19385862
- ISBN:
- 9781566775687 [156677568X]
- 言語:
- 英語
- 請求記号:
- E23400/11-2
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
COPPER LOW-k CONTAMINANTION AND POST ETCH RESIDUES REMOVAL USING SUPERCRITICAL C02-BASED PROCESSES
Electrochemical Society |
7
国際会議録
IMPROVED POST-ETCH VIA CLEAN WITH FLUORIDE BASED SEMI-AQUEOUS CHEMISTRY USING INTERMEDIATE RINSE
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
10
国際会議録
POST-ETCH CLEANING OF 300 mm DUAL DAMASCENE LOW-k DIELECTRIC STRUCTURES USING SUPERCRITICAL CO2
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |