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Langmuir-probe Characterization of an Inductively-Coupled Remote Plasma System intended for CVD and ALD

著者名:
掲載資料名:
Fundamental Gas-Phase and Surface Chemistry of Vapor-Phase Materials Processing 3
シリーズ名:
ECS transactions
シリーズ巻号:
2(7)
発行年:
2007
開始ページ:
181
終了ページ:
191
総ページ数:
11
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
19385862
ISBN:
9781566775182 [1566775183]
言語:
英語
請求記号:
E23400/2-7 [7]
資料種別:
国際会議録

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