Strain Loss in Epitaxial Si:C Films Induced by Phosphorus Diffusion

Strain Loss in Epitaxial Si:C Films Induced by Phosphorus Diffusion

著者名:

掲載資料名:

SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices

シリーズ名:

ECS transactions

シリーズ巻号:

16(10)

発行年:

2008

開始ページ:

1021

終了ページ:

1024

総ページ数:

4

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

19385862

ISBN:

9781566776561 [1566776562]

言語:

英語

請求記号:

E23400/16-10

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00047173
シリーズID:	PA00000034
会議名:	SiGe, Ge, and Related Compounds: Materials, Processing, and Devices Symposium ; PRiME Joint International Conference
回次:	3rd ; 2008
会議開催地:	Honolulu, Hawaii, USA
会議開催年:	2008.10.12-2008.10.17
論文注記:	3rd SiGe, Ge, and Related Compounds: Materials, Processing, and Devices Symposium which is part of the PRiME 2008 Joint International Conference held in Honolulu, Hawaii from October 12-17, 2008

類似資料:

1 国際会議録 Strain Engineering for Si CMOS Technology (Invited paper) Sadana, D. K., Bedell, S. W., Reznicek, A., de Souza, J.P., Fogel, K., Hovel, H. Electrochemical Society	7 国際会議録 (8.6) 5:55 - 6:15 PM Strained-Silcon / Silicbn- Germanium-on-Insulator for High Peformance CMOS - A Manufacturable Process for 300 MM Substrates Reznicek, A., Bedell, S. W., Hovel, H. J., Fogel, K. E., Ott, J. A., Mitchell, R. M., Sadana, D. K. (IBM) Electrochemical Society
2 国際会議録 Advanced Applications of Semiconductor Epitaxy for Cutting Edge Integrated Circuit Technolgy D. Sadana, M. Yang, S.W. Bedell, A. Reznicek, J.P. de Souza Electrochemical Society	8 国際会議録 Diffusion of Phosphorus in Strained Si/SiGe/Si Heterostructures Kuznetsov, A. Yu., Christensen, J. S., Linnarsson, M. K., Svensson, B. G., Radamson, H. H., Grahn, J., Landgren, G. MRS - Materials Research Society
3 国際会議録 Amorphization/Templated Recrystallization (ATR) Method for Hybrid Orientation Substrates K. L. Saenger, J. P. de Souza, K. E. Fogel, J. A. Ott, A. Reznicek, C. Y. Sung, H. Yin, D. K. Sadana Materials Research Society	9 国際会議録 Laser Interferimetry: A Measurement Technique for Diffusion in Thin Polymer Films Saenger L. K. Society of Plastics Engineers, Inc. (SPE)
4 国際会議録 Characterization of ultra thin SOI and SSOI substrates: defect and strain analysis Invited Bedell, S.W., Hovel, H., Domenicucci, A., Fogel, K., Reznicek, A., Sadana, D.K. Electrochemical Society	10 国際会議録 Effect of Elevated Implant Temperature on Amorphization and Activation in As-implanted Silicon-on-insulator Layers Katherine L. Saenger, Stephen W. Bedell, Matthew Copel, Amlan Majumdar, John A. Ott, Joel P. de Souza, Steven J. … Materials Research Society
5 国際会議録 Substrate Engineering for Germanium-Based CMOS Technology S.W. Bedell, K. Fogel, A. Reznicek, J. Ott, D. Sadana Electrochemical Society	11 国際会議録 Epitaxial Growth of Void-Free 3C-SiC Thin Film on Si Substrate Seo, Y.H., Nahm, K.S., Suh, F.K., Lee, H.J., Kim, D., Lee, B. Electrochemical Society
6 国際会議録 New Techniques for Diffusion Studies on Thin Polymer Films Tong, H., Saenger, K. Society of Plastics Engineers, Inc. (SPE)	12 国際会議録 High Mobility Channels for Ultimate CMOS D. Sadana, S. Koester, Y. Sun, E. W. Kiewra, S. W. Bedell, A. Reznicek, J. Ott, K. Fogel, D. J. Webb, J. Fompeyrine, J. … Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12