Oxidative Removal of Self-Assembled Monolayers for Selective Atomic Layer Deposition
類似資料:
1
国際会議録
Controlling Area-Selective Atomic Layer Deposition of HfO2 Dielectric by Self-Assembled Monolayers
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
8
国際会議録
SrTiO3 Thin Film Growth by Atomic Layer Deposition Using Ti(O-iPr)2(thd)2, Sr(thd)2, and H2O
Electrochemical Society |
MRS-Materials Research Society |
Materials Research Society |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
MRS-Materials Research Society |
American Institute of Chemical Engineers |