Instability and Defects in Gate Dielectric: Similarity and Differences Between Hf-Stacks and SiO2
類似資料:
Materials Research Society |
7
国際会議録
13 High-k Gate Stack Engineering - towards Meeting Low Standby Power and High Performance Targets
Electrochemical Society |
Electrochemical Society |
MRS - Materials Research Society |
Electrochemical Society |
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
Electrochemical Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |